Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor

Hamelmann F, Brechling A, Aschentrup A, Heinzmann U, Jutzi P, Sandrock J, Siemeling U (2003)
In: Chemical Vapor Deposition CVD XVI ECS Proceedings. Allendorf M, Maury F, Teyssandier F (Eds); .

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Sammelwerksbeitrag | Englisch
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Chemical Vapor Deposition CVD XVI ECS Proceedings
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Hamelmann F, Brechling A, Aschentrup A, et al. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf M, Maury F, Teyssandier F, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings. 2003.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., & Siemeling, U. (2003). Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier (Eds.), Chemical Vapor Deposition CVD XVI ECS Proceedings
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., and Siemeling, U. (2003). “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor” in Chemical Vapor Deposition CVD XVI ECS Proceedings, Allendorf, M., Maury, F., and Teyssandier, F. eds.
Hamelmann, F., et al., 2003. Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In M. Allendorf, F. Maury, & F. Teyssandier, eds. Chemical Vapor Deposition CVD XVI ECS Proceedings.
F. Hamelmann, et al., “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”, Chemical Vapor Deposition CVD XVI ECS Proceedings, M. Allendorf, F. Maury, and F. Teyssandier, eds., 2003.
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., Siemeling, U.: Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor. In: Allendorf, M., Maury, F., and Teyssandier, F. (eds.) Chemical Vapor Deposition CVD XVI ECS Proceedings. (2003).
Hamelmann, Frank, Brechling, Armin, Aschentrup, A, Heinzmann, Ulrich, Jutzi, Peter, Sandrock, J, and Siemeling, U. “Thin Tungsten and Tungsten Oxide Films Produced by Tungsten Pentacarbonoyle Pentylisonitrile in a Remote Plasma Reactor”. Chemical Vapor Deposition CVD XVI ECS Proceedings. Ed. M Allendorf, F Maury, and F Teyssandier. 2003.

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