Structural investigation of alumina thin films deposited by chemical vapor deposition

Bahlawane N, Blittersdorf S, Kohse-Höinghaus K, Atakan B, Müller J (2003)
Materials Research Society Symposium Proceedings 750: 279-284.

Journal Article | Published | English

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Bahlawane N, Blittersdorf S, Kohse-Höinghaus K, Atakan B, Müller J. Structural investigation of alumina thin films deposited by chemical vapor deposition. Materials Research Society Symposium Proceedings. 2003;750:279-284.
Bahlawane, N., Blittersdorf, S., Kohse-Höinghaus, K., Atakan, B., & Müller, J. (2003). Structural investigation of alumina thin films deposited by chemical vapor deposition. Materials Research Society Symposium Proceedings, 750, 279-284.
Bahlawane, N., Blittersdorf, S., Kohse-Höinghaus, K., Atakan, B., and Müller, J. (2003). Structural investigation of alumina thin films deposited by chemical vapor deposition. Materials Research Society Symposium Proceedings 750, 279-284.
Bahlawane, N., et al., 2003. Structural investigation of alumina thin films deposited by chemical vapor deposition. Materials Research Society Symposium Proceedings, 750, p 279-284.
N. Bahlawane, et al., “Structural investigation of alumina thin films deposited by chemical vapor deposition”, Materials Research Society Symposium Proceedings, vol. 750, 2003, pp. 279-284.
Bahlawane, N., Blittersdorf, S., Kohse-Höinghaus, K., Atakan, B., Müller, J.: Structural investigation of alumina thin films deposited by chemical vapor deposition. Materials Research Society Symposium Proceedings. 750, 279-284 (2003).
Bahlawane, Naoufal, Blittersdorf, Sabine, Kohse-Höinghaus, Katharina, Atakan, Burak, and Müller, Jürgen. “Structural investigation of alumina thin films deposited by chemical vapor deposition”. Materials Research Society Symposium Proceedings 750 (2003): 279-284.
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