Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography

Eck W, Stadler V, Geyer W, Zharnikov M, Gölzhäuser A, Grunze M (2000)
Advanced Materials 12(11): 805-808.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Erscheinungsjahr
Zeitschriftentitel
Advanced Materials
Band
12
Zeitschriftennummer
11
Seite
805-808
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Eck W, Stadler V, Geyer W, Zharnikov M, Gölzhäuser A, Grunze M. Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography. Advanced Materials. 2000;12(11):805-808.
Eck, W., Stadler, V., Geyer, W., Zharnikov, M., Gölzhäuser, A., & Grunze, M. (2000). Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography. Advanced Materials, 12(11), 805-808.
Eck, W., Stadler, V., Geyer, W., Zharnikov, M., Gölzhäuser, A., and Grunze, M. (2000). Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography. Advanced Materials 12, 805-808.
Eck, W., et al., 2000. Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography. Advanced Materials, 12(11), p 805-808.
W. Eck, et al., “Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography”, Advanced Materials, vol. 12, 2000, pp. 805-808.
Eck, W., Stadler, V., Geyer, W., Zharnikov, M., Gölzhäuser, A., Grunze, M.: Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography. Advanced Materials. 12, 805-808 (2000).
Eck, W., Stadler, V., Geyer, W., Zharnikov, M., Gölzhäuser, Armin, and Grunze, M. “Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography”. Advanced Materials 12.11 (2000): 805-808.