Chemical Nanolithography with Electron Beams

Gölzhäuser A, Eck W, Geyer W, Stadler V, Weimann T, Hinze P, Grunze M (2001)
ADVANCED MATERIALS 13.

Journal Article | Published | English

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Gölzhäuser A, Eck W, Geyer W, et al. Chemical Nanolithography with Electron Beams. ADVANCED MATERIALS. 2001;13.
Gölzhäuser, A., Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., & Grunze, M. (2001). Chemical Nanolithography with Electron Beams. ADVANCED MATERIALS, 13.
Gölzhäuser, A., Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., and Grunze, M. (2001). Chemical Nanolithography with Electron Beams. ADVANCED MATERIALS 13.
Gölzhäuser, A., et al., 2001. Chemical Nanolithography with Electron Beams. ADVANCED MATERIALS, 13.
A. Gölzhäuser, et al., “Chemical Nanolithography with Electron Beams”, ADVANCED MATERIALS, vol. 13, 2001.
Gölzhäuser, A., Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., Grunze, M.: Chemical Nanolithography with Electron Beams. ADVANCED MATERIALS. 13, (2001).
Gölzhäuser, Armin, Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., and Grunze, M. “Chemical Nanolithography with Electron Beams”. ADVANCED MATERIALS 13 (2001).
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