Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases

Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A (2004)
Vacuum 76 76(2-3): 139-142.

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Aschentrup A, Szekeres A, Gesheva K, Hamelmann F, Heinzmann U, Brechling A. Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76. 2004;76(2-3):139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., & Brechling, A. (2004). Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), 139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., and Brechling, A. (2004). Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76 76, 139-142.
Aschentrup, A., et al., 2004. Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76, 76(2-3), p 139-142.
A. Aschentrup, et al., “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”, Vacuum 76, vol. 76, 2004, pp. 139-142.
Aschentrup, A., Szekeres, A., Gesheva, K., Hamelmann, F., Heinzmann, U., Brechling, A.: Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum 76. 76, 139-142 (2004).
Aschentrup, Andreas, Szekeres, A., Gesheva, K., Hamelmann, Frank, Heinzmann, Ulrich, and Brechling, Armin. “Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases”. Vacuum 76 76.2-3 (2004): 139-142.
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