Fabrication and characterization of Si-based soft x-ray mirrors

Schmiedeskamp B, Heidemann B, Kleineberg U, Kloidt A, Kühne M, Müller H, Müller P, Nolting K, Heinzmann U (1991)
In: X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography. Proceedings / SPIE, the International Society for Optical Engineering ; 1343, . Bellingham, Wash.: SPIE - The International Society for Optical Engineering: 64-72.

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Abstract
Silicon-metal multilayers, which are designed as soft x-ray mirrors, have been fabricated with e – beam evaporation in Bielefeld. Quartz oscillators and in situ soft x-ray reflection with C-k radiation were applied to control the fabrication process. The Mo/Si and Ta/Si layer systems were fabricated for wavelengths between 12 and 30nm and normal radiation incidence. They were studied with synchrotron radiation soft x-ray reflection in the PTB laboratory at BESSY in Berlin and with Cu-K[alpha] reflection as well as the surface analytical methods Rutherford-Backscattering (RBS) and Sputtering in combination with Auger electron spectroscopy (Sputter/AES) in Bielefeld. The optical data, C-k in situ reflectivity, Cu-k[alpha] and synchrotron radiation reflection, are compared with calculations on the basis of the Fresnel equations. Tests were made with RBS and Sputter/AES to prove their suitability for a study of the multilayer microstructures and their changes after thermal treatments.
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Schmiedeskamp B, Heidemann B, Kleineberg U, et al. Fabrication and characterization of Si-based soft x-ray mirrors. In: X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography. Proceedings / SPIE, the International Society for Optical Engineering ; 1343. Bellingham, Wash.: SPIE - The International Society for Optical Engineering; 1991: 64-72.
Schmiedeskamp, B., Heidemann, B., Kleineberg, U., Kloidt, A., Kühne, M., Müller, H., Müller, P., et al. (1991). Fabrication and characterization of Si-based soft x-ray mirrors. X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography, 64-72.
Schmiedeskamp, B., Heidemann, B., Kleineberg, U., Kloidt, A., Kühne, M., Müller, H., Müller, P., Nolting, K., and Heinzmann, U. (1991). “Fabrication and characterization of Si-based soft x-ray mirrors” in X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography Proceedings / SPIE, the International Society for Optical Engineering ; 1343 (Bellingham, Wash.: SPIE - The International Society for Optical Engineering), 64-72.
Schmiedeskamp, B., et al., 1991. Fabrication and characterization of Si-based soft x-ray mirrors. In X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography. Proceedings / SPIE, the International Society for Optical Engineering ; 1343. Bellingham, Wash.: SPIE - The International Society for Optical Engineering, pp. 64-72.
B. Schmiedeskamp, et al., “Fabrication and characterization of Si-based soft x-ray mirrors”, X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography, Proceedings / SPIE, the International Society for Optical Engineering ; 1343, Bellingham, Wash.: SPIE - The International Society for Optical Engineering, 1991, pp.64-72.
Schmiedeskamp, B., Heidemann, B., Kleineberg, U., Kloidt, A., Kühne, M., Müller, H., Müller, P., Nolting, K., Heinzmann, U.: Fabrication and characterization of Si-based soft x-ray mirrors. X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography. Proceedings / SPIE, the International Society for Optical Engineering ; 1343. p. 64-72. SPIE - The International Society for Optical Engineering, Bellingham, Wash. (1991).
Schmiedeskamp, B., Heidemann, B., Kleineberg, U., Kloidt, A., Kühne, M., Müller, H., Müller, P., Nolting, K., and Heinzmann, Ulrich. “Fabrication and characterization of Si-based soft x-ray mirrors”. X-ray EUV optics for astronomy, microscopy, polarimetry, and projection lithography. Bellingham, Wash.: SPIE - The International Society for Optical Engineering, 1991. Proceedings / SPIE, the International Society for Optical Engineering ; 1343. 64-72.
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