Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS

Heidemann B, Tappe T, Schmiedeskamp B, Heinzmann U (1994)
Applied Surface Science 78(2): 133-140.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Zeitschriftentitel
Applied Surface Science
Band
78
Zeitschriftennummer
2
Seite
133-140
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Heidemann B, Tappe T, Schmiedeskamp B, Heinzmann U. Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science. 1994;78(2):133-140.
Heidemann, B., Tappe, T., Schmiedeskamp, B., & Heinzmann, U. (1994). Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science, 78(2), 133-140. doi:10.1016/0169-4332(94)00114-6
Heidemann, B., Tappe, T., Schmiedeskamp, B., and Heinzmann, U. (1994). Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science 78, 133-140.
Heidemann, B., et al., 1994. Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science, 78(2), p 133-140.
B. Heidemann, et al., “Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS”, Applied Surface Science, vol. 78, 1994, pp. 133-140.
Heidemann, B., Tappe, T., Schmiedeskamp, B., Heinzmann, U.: Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS. Applied Surface Science. 78, 133-140 (1994).
Heidemann, B., Tappe, T., Schmiedeskamp, B., and Heinzmann, Ulrich. “Interlayer composition and interface stability in Mo/Si multilayers studied with high-resolution RBS”. Applied Surface Science 78.2 (1994): 133-140.
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