Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation

Stock HJ, Kleineberg U, Heidemann B, Hilgers K, Kloidt A, Schmiedeskamp B, Heinzmann U, Krumrey M, Müller P, Scholze F (1994)
Applied Physics A: Materials Science and Processing 58(4): 371-376.

Download
OA
Journal Article | Published | English
Author
; ; ; ; ; ; ; ; ;
Abstract
Mo/Si multilayers are fabricated by electron-beam evaporation in UHV at different temperatures (30° C, 150° C, 200° C) during deposition. After completion their thermal stability is tested by baking them at temperatures (T bak) between 200° C and 800° C in steps of 50° C or 100° C. After each baking step the multilayers are characterized by small angle CuK[Alpha]-X-ray diffraction. Additionally, the normal incidence soft-X-ray reflectivity for wavelengths between 11 nm and 19 nm is determined after baking at 500° C. Furthermore, the layer structure of the multilayers is investigated by means of Rutherford Backscattering Spectroscopy (RBS) and sputter/Auger Electron Spectroscopy (AES) technique. While the reflectivity turns out to be highest for a deposition temperature of 150° C, the thermal stability of the multilayer increases with deposition temperature. The multilayer deposited at 200° C stands even a 20 min 500° C baking without considerable changes in the reflectivity behaviour.
Publishing Year
ISSN
eISSN
PUB-ID

Cite this

Stock HJ, Kleineberg U, Heidemann B, et al. Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation. Applied Physics A: Materials Science and Processing. 1994;58(4):371-376.
Stock, H. J., Kleineberg, U., Heidemann, B., Hilgers, K., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., et al. (1994). Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation. Applied Physics A: Materials Science and Processing, 58(4), 371-376.
Stock, H. J., Kleineberg, U., Heidemann, B., Hilgers, K., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., Krumrey, M., Müller, P., and Scholze, F. (1994). Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation. Applied Physics A: Materials Science and Processing 58, 371-376.
Stock, H.J., et al., 1994. Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation. Applied Physics A: Materials Science and Processing, 58(4), p 371-376.
H.J. Stock, et al., “Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation”, Applied Physics A: Materials Science and Processing, vol. 58, 1994, pp. 371-376.
Stock, H.J., Kleineberg, U., Heidemann, B., Hilgers, K., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., Krumrey, M., Müller, P., Scholze, F.: Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation. Applied Physics A: Materials Science and Processing. 58, 371-376 (1994).
Stock, H. J., Kleineberg, U., Heidemann, B., Hilgers, K., Kloidt, A., Schmiedeskamp, B., Heinzmann, Ulrich, Krumrey, M., Müller, P., and Scholze, F. “Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation”. Applied Physics A: Materials Science and Processing 58.4 (1994): 371-376.
Main File(s)
Access Level
OA Open Access

This data publication is cited in the following publications:
This publication cites the following data publications:

Export

0 Marked Publications

Open Data PUB

Web of Science

View record in Web of Science®

Search this title in

Google Scholar