Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity

Stock HJ, Kleineberg U, Kloidt A, Schmiedeskamp B, Heinzmann U, Krumrey M, Müller P, Scholze F (1993)
Applied Physics Letters 63(16): 2207-2209.

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Stock HJ, Kleineberg U, Kloidt A, et al. Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters. 1993;63(16):2207-2209.
Stock, H. J., Kleineberg, U., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., Krumrey, M., Müller, P., et al. (1993). Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters, 63(16), 2207-2209.
Stock, H. J., Kleineberg, U., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., Krumrey, M., Müller, P., and Scholze, F. (1993). Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters 63, 2207-2209.
Stock, H.J., et al., 1993. Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters, 63(16), p 2207-2209.
H.J. Stock, et al., “Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity”, Applied Physics Letters, vol. 63, 1993, pp. 2207-2209.
Stock, H.J., Kleineberg, U., Kloidt, A., Schmiedeskamp, B., Heinzmann, U., Krumrey, M., Müller, P., Scholze, F.: Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity. Applied Physics Letters. 63, 2207-2209 (1993).
Stock, H. J., Kleineberg, U., Kloidt, A., Schmiedeskamp, B., Heinzmann, Ulrich, Krumrey, M., Müller, P., and Scholze, F. “Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity”. Applied Physics Letters 63.16 (1993): 2207-2209.
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