Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment

Kloidt A, Stock HJ, Kleineberg U, Döhring T, Pröpper M, Schmiedeskamp B, Heinzmann U (1993)
Thin Solid Films 228(1-2): 154-157.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Abstract / Bemerkung
Mo/Si multilayers with a bilayer thickness of 2.6 nm are produced by electron beam evaporation in ultrahigh vacuum for soft X-ray optical applications. High reflectivities resulting from constructive interference in the stack are limited by the optical constants of the materials and by the quality of the interfaces. Smoothing of the boundaries is obtained by bombardment of the deposited layers with Ar+ ions. The smoothness of the interfaces is controlled during the deposition by in situ measurement of the reflectivity for the C K radiation of the stack and after completion of the stack by means of a grazing X-ray reflection set-up with Cu K[Alpha] radiation. The soft X-ray reflectivity is measured with a laser-induced plasma light source.
Erscheinungsjahr
Zeitschriftentitel
Thin Solid Films
Band
228
Zeitschriftennummer
1-2
Seite
154-157
ISSN
PUB-ID

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Kloidt A, Stock HJ, Kleineberg U, et al. Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films. 1993;228(1-2):154-157.
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., & Heinzmann, U. (1993). Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films, 228(1-2), 154-157. doi:10.1016/0040-6090(93)90586-E
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., and Heinzmann, U. (1993). Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films 228, 154-157.
Kloidt, A., et al., 1993. Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films, 228(1-2), p 154-157.
A. Kloidt, et al., “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment”, Thin Solid Films, vol. 228, 1993, pp. 154-157.
Kloidt, A., Stock, H.J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., Heinzmann, U.: Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment. Thin Solid Films. 228, 154-157 (1993).
Kloidt, A., Stock, H. J., Kleineberg, U., Döhring, T., Pröpper, M., Schmiedeskamp, B., and Heinzmann, Ulrich. “Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment”. Thin Solid Films 228.1-2 (1993): 154-157.
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