ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS

SCHMIEDESKAMP B, KLOIDT A, STOCK HJ, KLEINEBERG U, DOHRING T, PROPPER M, RAHN S, HILGERS K, HEIDEMANN B, TAPPE T, Heinzmann U, et al. (1994)
OPTICAL ENGINEERING 33(4): 1314-1321.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Abstract / Bemerkung
For the wavelength region above the Si-L edge normal incidence, soft x-ray mirrors are produced with peak reflectivities close to 60%. The multilayer systems consist of molybdenum and silicon and are fabricated by electron beam evaporation in ultrahigh vacuum. A smoothing of the boundaries, and thereby a drastic enhancement of the reflectivity, is obtained by thermal treatment of the multilayer systems during growth. The thermal stability of the multilayer stacks could be improved considerably up to 850-degrees-C by mixing Mo and Si in the absorber layers and producing thus Mo(x)Si(y)/Si multilayers with x and y denoting the amounts of Mo and Si in the absorber layer, respectively. First attempts are reported to produce mirrors with a bilayer thickness of 2.6 nm. An improvement in the quality of these interfaces can be obtained by bombardment with Ar+ ions. We report on normal incidence reflectivity measurements of the mirrors with synchrotron radiation and finally on the normal incidence diffraction efficiencies of a Mo/Si multilayer coated grating, for which values of 5.5% are achieved for the + 1'st and - 1'st diffraction orders.
Erscheinungsjahr
Zeitschriftentitel
OPTICAL ENGINEERING
Band
33
Zeitschriftennummer
4
Seite
1314-1321
ISSN
PUB-ID

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SCHMIEDESKAMP B, KLOIDT A, STOCK HJ, et al. ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS. OPTICAL ENGINEERING. 1994;33(4):1314-1321.
SCHMIEDESKAMP, B., KLOIDT, A., STOCK, H. J., KLEINEBERG, U., DOHRING, T., PROPPER, M., RAHN, S., et al. (1994). ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS. OPTICAL ENGINEERING, 33(4), 1314-1321. doi:10.1117/12.163207
SCHMIEDESKAMP, B., KLOIDT, A., STOCK, H. J., KLEINEBERG, U., DOHRING, T., PROPPER, M., RAHN, S., HILGERS, K., HEIDEMANN, B., TAPPE, T., et al. (1994). ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS. OPTICAL ENGINEERING 33, 1314-1321.
SCHMIEDESKAMP, B., et al., 1994. ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS. OPTICAL ENGINEERING, 33(4), p 1314-1321.
B. SCHMIEDESKAMP, et al., “ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS”, OPTICAL ENGINEERING, vol. 33, 1994, pp. 1314-1321.
SCHMIEDESKAMP, B., KLOIDT, A., STOCK, H.J., KLEINEBERG, U., DOHRING, T., PROPPER, M., RAHN, S., HILGERS, K., HEIDEMANN, B., TAPPE, T., Heinzmann, U., KRUMREY, M.K., MULLER, P., SCHOLZE, F., HEIDEMANN, K.F.: ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS. OPTICAL ENGINEERING. 33, 1314-1321 (1994).
SCHMIEDESKAMP, B, KLOIDT, A, STOCK, HJ, KLEINEBERG, U, DOHRING, T, PROPPER, M, RAHN, S, HILGERS, K, HEIDEMANN, B, TAPPE, T, Heinzmann, Ulrich, KRUMREY, MK, MULLER, P, SCHOLZE, F, and HEIDEMANN, KF. “ELECTRON-BEAM-DEPOSITED MO/SI AND MO(X)SI(Y)/SI MULTILAYER X-RAY MIRRORS AND GRATINGS”. OPTICAL ENGINEERING 33.4 (1994): 1314-1321.