Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

Maul J, Lin J, Oelsner A, Valdaitsev D, Weber N, Escher M, Merkel M, Seitz H, Heinzmann U, Kleineberg U, Schoenhense G (2007) .

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We report on recent developments of an "at wavelength" full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nut wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first, results obtained from a six inches mask blank prototype as prerequisite for industrial usage. (c) 2007 Elsevier B.V. All rights reserved.
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Maul J, Lin J, Oelsner A, et al. Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode.
Maul, J., Lin, J., Oelsner, A., Valdaitsev, D., Weber, N., Escher, M., Merkel, M., et al. (2007). Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode. Presented at the .
Maul, J., Lin, J., Oelsner, A., Valdaitsev, D., Weber, N., Escher, M., Merkel, M., Seitz, H., Heinzmann, U., Kleineberg, U., et al. (2007).“Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode”.
Maul, J., et al., 2007. Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode.
J. Maul, et al., “Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode”, ELSEVIER SCIENCE BV, 2007.
Maul, J., Lin, J., Oelsner, A., Valdaitsev, D., Weber, N., Escher, M., Merkel, M., Seitz, H., Heinzmann, U., Kleineberg, U., Schoenhense, G.: Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode. (2007).
Maul, J., Lin, J., Oelsner, A., Valdaitsev, D., Weber, N., Escher, M., Merkel, M., Seitz, H., Heinzmann, Ulrich, Kleineberg, U., and Schoenhense, G. “Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode”., ELSEVIER SCIENCE BV, 2007.
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