Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition

Premkumar PA, Turchanin A, Bahlawane N (2007)
CHEMISTRY OF MATERIALS 19(25): 6206-6211.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Abstract / Bemerkung
Cobalt and cobalt carbide films were obtained using chemical vapor deposition (CVD) at low pressure in a hydrogen-free atmosphere at temperatures below 300 degrees C. Although the growth over bare glass was enabled, the use of a 5 nm nickel seed layer improves the morphology and eliminates the incubation time. The pulsed-spray evaporation using alcohol solutions of cobalt acetylacetonate as a liquid feedstock allows the growth of metallic cobalt or cobalt carbide, depending on the choice of the alcohol and of the deposition temperature. The growth of Co2C was obtained, for the first time with CVD, using an ethanol precursor solution at temperatures in the ran-e of 205-230 degrees C, whereas the deposition of high-quality metallic crystalline cobalt is attained with an n-propanol precursor solution at substrate temperatures above 250 degrees C. The obtained metallic films reach a near-bulk electrical resistivity for thicknesses above 300 nm.
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Zeitschriftentitel
CHEMISTRY OF MATERIALS
Band
19
Zeitschriftennummer
25
Seite
6206-6211
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Premkumar PA, Turchanin A, Bahlawane N. Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition. CHEMISTRY OF MATERIALS. 2007;19(25):6206-6211.
Premkumar, P. A., Turchanin, A., & Bahlawane, N. (2007). Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition. CHEMISTRY OF MATERIALS, 19(25), 6206-6211. doi:10.1021/cm701957s
Premkumar, P. A., Turchanin, A., and Bahlawane, N. (2007). Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition. CHEMISTRY OF MATERIALS 19, 6206-6211.
Premkumar, P.A., Turchanin, A., & Bahlawane, N., 2007. Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition. CHEMISTRY OF MATERIALS, 19(25), p 6206-6211.
P.A. Premkumar, A. Turchanin, and N. Bahlawane, “Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition”, CHEMISTRY OF MATERIALS, vol. 19, 2007, pp. 6206-6211.
Premkumar, P.A., Turchanin, A., Bahlawane, N.: Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition. CHEMISTRY OF MATERIALS. 19, 6206-6211 (2007).
Premkumar, Peter Antony, Turchanin, Andrey, and Bahlawane, Naoufal. “Effect of solvent on the growth of co and CO2C using pulsed-spray evaporation chemical vapor deposition”. CHEMISTRY OF MATERIALS 19.25 (2007): 6206-6211.