Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films

Klipp A, Hamelmann F, Haindl G, Hartwich J, Kleineberg U, Jutzi P, Heinzmann U (2000)
CHEMICAL VAPOR DEPOSITION 6(2): 63-66.

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Zeitschriftenaufsatz | Veröffentlicht | Englisch
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Abstract / Bemerkung
There is a strong demand for alternative precursors for Si CVD that do not have the problems of highly pyrophoric silanes. Me5C5Si2H5 is an easy to handle liquid precursor that shows promise for CVD of Si-containing films. The fragmentation process (see Figure) has been studied by in-situ mass spectrometry and the pronounced leaving group character results in no carbon incorporation.
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CHEMICAL VAPOR DEPOSITION
Band
6
Zeitschriftennummer
2
Seite
63-66
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Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION. 2000;6(2):63-66.
Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION, 6(2), 63-66. doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., and Heinzmann, U. (2000). Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION 6, 63-66.
Klipp, A., et al., 2000. Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION, 6(2), p 63-66.
A. Klipp, et al., “Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films”, CHEMICAL VAPOR DEPOSITION, vol. 6, 2000, pp. 63-66.
Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., Heinzmann, U.: Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films. CHEMICAL VAPOR DEPOSITION. 6, 63-66 (2000).
Klipp, A, Hamelmann, Frank, Haindl, G, Hartwich, J, Kleineberg, U, Jutzi, Peter, and Heinzmann, Ulrich. “Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films”. CHEMICAL VAPOR DEPOSITION 6.2 (2000): 63-66.