Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Lim YC, Westermalbesloh T, Aschentrup A, Wehmeyer O, Haindl G, Kleineberg U, Heinzmann U (2001)
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 72(1): 121-124.
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Zeitschriftenaufsatz
| Veröffentlicht
| Englisch
Autor
Lim, YC;
Westermalbesloh, T;
Aschentrup, A;
Wehmeyer, O;
Haindl, G;
Kleineberg, U;
Heinzmann, UlrichUniBi
Abstract / Bemerkung
Our aim was to produce EUV multilayer mirrors with a small spectral bandwidth DeltaE less than or equal to 3 eV at 70 eV peak energy using UHV electron beam evaporation by varying the thickness ratio (Gamma = d(Abs)/d(Sp) + d(Abs)) between the absorber layer and the bilayer. The deposition process was controlled by in situ soft X-ray reflectometry, and ion-beam polishing as well as substrate-heating methods were applied to reduce the interface roughness. The reflection properties of the Mo-Si multilayer mirrors prepared were characterized by hard and soft X-ray reflectometry and details of the multilayer structure were revealed from cross-sectional transmission electron microscopy.
Erscheinungsjahr
Zeitschriftentitel
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Band
72
Zeitschriftennummer
1
Seite
121-124
ISSN
PUB-ID
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Lim YC, Westermalbesloh T, Aschentrup A, et al. Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. 2001;72(1):121-124.
Lim, Y. C., Westermalbesloh, T., Aschentrup, A., Wehmeyer, O., Haindl, G., Kleineberg, U., & Heinzmann, U. (2001). Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 72(1), 121-124. doi:10.1007/s003390000723
Lim, Y. C., Westermalbesloh, T., Aschentrup, A., Wehmeyer, O., Haindl, G., Kleineberg, U., and Heinzmann, U. (2001). Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 72, 121-124.
Lim, Y.C., et al., 2001. Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 72(1), p 121-124.
Y.C. Lim, et al., “Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth”, APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, vol. 72, 2001, pp. 121-124.
Lim, Y.C., Westermalbesloh, T., Aschentrup, A., Wehmeyer, O., Haindl, G., Kleineberg, U., Heinzmann, U.: Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. 72, 121-124 (2001).
Lim, YC, Westermalbesloh, T, Aschentrup, A, Wehmeyer, O, Haindl, G, Kleineberg, U, and Heinzmann, Ulrich. “Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth”. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 72.1 (2001): 121-124.
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