Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling

Hoeink V, Schmalhorst J-M, Reiss G, Weis T, Lengemann D, Engel D, Ehresmann A (2008)
JOURNAL OF APPLIED PHYSICS 103(12): 123903.

Journal Article | Published | English

No fulltext has been uploaded

Author
; ; ; ; ; ;
Abstract
Artificial ferrimagnets have many applications as, e.g., pinned reference electrodes in magnetic tunnel junctions. It is known that the application of ion bombardment (IB) induced patterning of the exchange bias coupling of a single layer reference electrode in magnetic tunnel junctions with He ions is possible. For applications as, e.g., special types of magnetic logic, a combination of the IB induced patterning of the exchange bias coupling and the implementation of an artificial ferrimagnet as reference electrode is desirable. Here, investigations for a pinned artificial ferrimagnet with a Ru interlayer, which is frequently used in magnetic tunnel junctions, are presented. It is shown that in this kind of samples the exchange bias can be increased or rotated by IB induced magnetic patterning with 10 keV He ions without a destruction of the antiferromagnetic interlayer exchange coupling. An IrMn/Py/Co/Cu/Co stack turned out to be more sensitive to the influence of IB than the Ru based artificial ferrimagnet. (C) 2008 American Institute of Physics.
Publishing Year
ISSN
PUB-ID

Cite this

Hoeink V, Schmalhorst J-M, Reiss G, et al. Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling. JOURNAL OF APPLIED PHYSICS. 2008;103(12): 123903.
Hoeink, V., Schmalhorst, J. - M., Reiss, G., Weis, T., Lengemann, D., Engel, D., & Ehresmann, A. (2008). Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling. JOURNAL OF APPLIED PHYSICS, 103(12): 123903.
Hoeink, V., Schmalhorst, J. - M., Reiss, G., Weis, T., Lengemann, D., Engel, D., and Ehresmann, A. (2008). Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling. JOURNAL OF APPLIED PHYSICS 103:123903.
Hoeink, V., et al., 2008. Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling. JOURNAL OF APPLIED PHYSICS, 103(12): 123903.
V. Hoeink, et al., “Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling”, JOURNAL OF APPLIED PHYSICS, vol. 103, 2008, : 123903.
Hoeink, V., Schmalhorst, J.-M., Reiss, G., Weis, T., Lengemann, D., Engel, D., Ehresmann, A.: Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling. JOURNAL OF APPLIED PHYSICS. 103, : 123903 (2008).
Hoeink, V., Schmalhorst, Jan-Michael, Reiss, Günter, Weis, T., Lengemann, D., Engel, D., and Ehresmann, A. “Influence of ion bombardment induced patterning of exchange bias in pinned artificial ferrimagnets on the interlayer exchange coupling”. JOURNAL OF APPLIED PHYSICS 103.12 (2008): 123903.
This data publication is cited in the following publications:
This publication cites the following data publications:

Export

0 Marked Publications

Open Data PUB

Web of Science

View record in Web of Science®

Search this title in

Google Scholar