7 Publikationen

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  • [7]
    2021 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2949960
    Graulich D, Krieft J, Moskaltsova A, et al. Quantitative comparison of the magnetic proximity effect in Pt detected by XRMR and XMCD. Applied Physics Letters. 2021;118(1): 012407.
    PUB | DOI | Download (ext.) | WoS
     
  • [6]
    2021 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2953403
    Graulich D, Krieft J, Moskaltsova A, et al. Erratum: Quantitative comparison of the magnetic proximity effect in Pt detected by XRMR and XMCD (vol 118, 012407, 2021). Applied Physics Letters. 2021;118(8): 089901.
    PUB | DOI | WoS
     
  • [5]
    2021 | Bielefelder E-Dissertation | PUB-ID: 2959924 OA
    Moskaltsova A. Development and optimization of ultrasensitive magnetoresistive sensors. Bielefeld: Universität Bielefeld; 2021.
    PUB | PDF
     
  • [4]
    2021 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2957078
    Elzwawy A, Piskin H, Akdogan N, et al. Current trends in planar Hall effect sensors: evolution, optimization, and applications. Journal of Physics D: Applied Physics . 2021;54(35): 353002.
    PUB | DOI | WoS
     
  • [3]
    2020 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2940692
    Moskaltsova A, Krieft J, Graulich D, Matalla-Wagner T, Kuschel T. Impact of the magnetic proximity effect in Pt on the total magnetic moment of Pt/Co/Ta trilayers studied by x-ray resonant magnetic reflectivity. AIP Advances. 2020;10(1): 015154.
    PUB | DOI | Download (ext.) | WoS | arXiv
     
  • [2]
    2020 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2943465 OA
    Krieft J, Graulich D, Moskaltsova A, Bouchenoire L, Francoual S, Kuschel T. Advanced data analysis procedure for hard x-ray resonant magnetic reflectivity discussed for Pt thin film samples of various complexity. Journal of Physics D: Applied Physics. 2020;53: 375004.
    PUB | PDF | DOI | Download (ext.) | WoS
     
  • [1]
    2018 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2921242
    Pires BJ, Silva AV, Moskaltsova A, et al. Multilevel process on large area wafers for nanoscale devices. JOURNAL OF MANUFACTURING PROCESSES. 2018;32:222-229.
    PUB | DOI | WoS
     

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