PUB - Publikationen an der Universität Bielefeld

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• [6]
  

  2022 | Bielefelder E-Dissertation | PUB-ID: 2966027

  Hepp, J., 2022. Industry Dynamics during Times of Disruption: Essays on Technological Regimes and a Pandemic from a Complex System Perspective, Bielefeld: Universität Bielefeld.

  PUB | PDF | DOI
   
• [5]
  

  2022 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2958412

  Dawid, H., & Hepp, J., 2022. Distributional Effects of Technological Regime Changes: Hysteresis, Concentration and Inequality Dynamics. Review of Evolutionary Political Economy, 3, p 137–167.

  PUB | PDF | DOI | Download (ext.)
   
• [4]
  

  2022 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 2961937

  Hepp, J., 2022. Being small at the right moment: Path dependence after a shift in the technological regime. Industrial and Corporate Change, : dtac001.

  PUB | DOI | WoS
   
• [3]
  

  2021 | Diskussionspapier | Veröffentlicht | PUB-ID: 2952428

  Basurto, A., et al., 2021. How to design virus containment polices? A joint analysis of economic and epidemic dynamics under the COVID-19 pandemic, Universität Bielefeld Working Papers in Economics and Management, no.06-2021, Bielefeld: Bielefeld University, Department of Business Administration and Economics.

  PUB | PDF | DOI
   
• [2]
  

  2021 | Diskussionspapier | Veröffentlicht | PUB-ID: 2952631

  Dawid, H., & Hepp, J., 2021. Distributional Effects of Technological Regime Changes: Hysteresis, Concentration and Inequality Dynamics, Universität Bielefeld Working Papers in Economics and Management, no.09-2021, Bielefeld: Bielefeld University, Department of Business Administration and Economics.

  PUB | PDF | DOI
   
• [1]
  

  2021 | Diskussionspapier | Veröffentlicht | PUB-ID: 2950351

  Hepp, J., 2021. Being small at the right moment: Path dependence after a shift in the technological regime, Universität Bielefeld Working Papers in Economics and Management, no.02-2021, Bielefeld: Bielefeld University, Department of Business Administration and Economics.

  PUB | PDF | DOI