Frank Reilmann
PEVZ-ID
5 Publikationen
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2009 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1590772Bahlawane, N., Premkumar, P. A., Reilmann, F., Kohse-Höinghaus, K., Wang, J., Qi, F., Gehl, B., et al. (2009). CVD of Conducting Ultrathin Copper Films. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 156(10), D452-D455. https://doi.org/10.1149/1.3205478PUB | DOI | WoS
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2008 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1586060Bahlawane, N., Reilmann, F., Schulz, S., Schuchmann, D., & Kohse-Höinghaus, K. (2008). Low-temperature thermolysis behavior of tetramethyl- and tetraethyldistibines. JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 19(9), 1336-1342. https://doi.org/10.1016/j.jasms.2008.06.009PUB | DOI | WoS | PubMed | Europe PMC
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2008 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1586928Bahlawane, N., Reilmann, F., Salameh, L. - C., & Kohse-Höinghaus, K. (2008). Mass-spectrometric monitoring of the thermally induced decomposition of trimethylgallium, tris(tert-butyl) gallium, and triethylantimony at low pressure conditions. JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 19(7), 947-954. https://doi.org/10.1016/j.jasms.2008.04.015PUB | DOI | WoS | PubMed | Europe PMC
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2007 | Zeitschriftenaufsatz | Veröffentlicht | PUB-ID: 1632420Schulz, S., Fahrenholz, S., Schuchmann, D., Kuczkowski, A., Assenmacher, W., Reilmann, F., Bahlawane, N., et al. (2007). Single source precursor-based HV-MOCVD deposition of binary group 13-antimonide thin films. SURFACE & COATINGS TECHNOLOGY, 201(22-23), 9071-9075. https://doi.org/10.1016/j.surfcoat.2007.03.045PUB | DOI | WoS
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2005 | Konferenzbeitrag | Veröffentlicht | PUB-ID: 2325519Gesthuizen, J., Huerta Miguelanez, A., Reilmann, F., Ros, R., & Bahlawane, N. (2005). Chemical vapor deposition of nickel thin films of glass using nickel acetylacetonate. PROCEEDINGS OF EUROCVD-15, 659-666. The Electrochemical Society.PUB